Plasma Chemistry And Plasma Processing

SCI SCIE

国际简称：PLASMA CHEM PLASMA P 参考译名：等离子化学和等离子处理

主要研究方向：工程技术-工程：化工非预警期刊审稿周期：较慢,6-12周

《等离子化学和等离子处理》(Plasma Chemistry And Plasma Processing)是一本由Springer US出版的以工程技术-工程：化工为研究特色的国际期刊，发表该领域相关的原创研究文章、评论文章和综述文章，及时报道该领域相关理论、实践和应用学科的最新发现，旨在促进该学科领域科学信息的快速交流。该期刊是一本未开放期刊，近三年没有被列入预警名单。

3区中科院分区
Q1 JCR分区
81 年发文量
3.5 IF影响因子
未开放 是否OA
57 H-index
1981 创刊年份
Quarterly 出版周期
English 出版语言

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

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Plasma Chemistry And Plasma Processing期刊信息

ISSN：0272-4324
出版语言：English
是否OA：未开放
E-ISSN：1572-8986
出版地区：UNITED STATES
是否预警：否
出版商：Springer US
出版周期：Quarterly
创刊时间：1981
开源占比：0.0935
Gold OA文章占比：20.00%
OA被引用占比：
出版国人文章占比：0
出版撤稿占比：
研究类文章占比：91.36%

Plasma Chemistry And Plasma Processing CiteScore评价数据（2026年6月最新版）

CiteScore

SJR

SNIP

CiteScore 指数

5.9

0.585

1.007

学科类别	分区	排名	百分位
大类：Physics and Astronomy 小类：Condensed Matter Physics	Q2	115 / 446	74%
大类：Physics and Astronomy 小类：Surfaces, Coatings and Films	Q2	41 / 141	71%
大类：Physics and Astronomy 小类：General Chemistry	Q2	123 / 402	69%
大类：Physics and Astronomy 小类：General Chemical Engineering	Q2	88 / 270	67%

名词解释：CiteScore 是衡量期刊所发表文献的平均受引用次数，是在 Scopus 中衡量期刊影响力的另一个指标。当年CiteScore 的计算依据是期刊最近4年（含计算年度）的被引次数除以该期刊近四年发表的文献数。例如，2022年的 CiteScore 计算方法为：2022年的 CiteScore =2019-2022年收到的对2019-2022年发表的文件的引用数量÷2019-2022年发布的文献数量注：文献类型包括：文章、评论、会议论文、书籍章节和数据论文。

Plasma Chemistry And Plasma Processing中科院评价数据

《新锐期刊分区表》（2026年3月发布）

Top期刊	综述期刊	大类学科		小类学科
否	否	物理与天体物理	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区

Plasma Chemistry And Plasma Processing JCR评价数据

2025-2026年最新版

按JCI指标学科分区	收录子集	分区	排名	百分位
学科：ENGINEERING, CHEMICAL	SCIE	Q2	90 / 183	51.1
学科：PHYSICS, APPLIED	SCIE	Q2	75 / 191	61
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q1	7 / 43	84.9
学科：ENGINEERING, CHEMICAL	SCIE	Q2	71 / 183	61.48
学科：PHYSICS, APPLIED	SCIE	Q2	72 / 191	62.57
学科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	19 / 43	56.98

Plasma Chemistry And Plasma Processing历年数据统计

影响因子

中科院分区

Plasma Chemistry And Plasma Processing中国学者发文选摘

1、A Pulse-Modulated Microwave Atmospheric Pressure Plasma Jet and its Applications in Polymer Modification
Author: Zhang, Dai; Zou, Daopeng; Guo, Ruilin; Huang, Yaoyao; Chang, Xijiang; Wu, Zhonghang; Xiong, Zilan

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 4, pp. -. DOI: 10.1007/s11090-026-10664-6
2、Two-Dimensional Simulation of the Discharge Characteristics of He Atmospheric Pressure Plasma Jet Arra
Author: Wang, Lijun; Liu, Junxian; Shi, Qinghua; Han, Zhongji; Zhao, Huan

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-026-10662-8
3、Study on Plasma Drying of Expandable Graphite and Influencing Factor
Author: Liu, Fei; Yu, Zhe; Zhang, Xiaochuan; Chen, Long; Song, Chunlian; Duan, Ping

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-026-10659-3
4、Influence of Particle Distribution on CO2 Dissociation and Discharge Behavior in a Fluidized-Bed DBD Reacto
Author: Maina, Francis; Kobayashi, Nobusuke; Masumbuko, Robert; Suami, Akira; Zhang, Baiqiang

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-026-10658-4
5、The Effects of Trace H2O on the Corona Discharge Decomposition of C5F10O/N2 Mixtures with Electron Attachment Mass Spectrometry Detectio
Author: Gao, Qingqing; Xiao, Yafan; Miao, Jiale; Wang, Xiaohua; Chen, Qiang; Yang, Aijun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-026-10651-x
6、Novel Pulsed AC-Driven Atmospheric-Pressure Dielectric Barrier Discharge: Achieving Ultra-High Energy Efficiency in Ozone Synthesi
Author: Zhou, Xiong-Feng; Dai, Jing; Liu, Kun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-026-10652-w
7、Plasma Effect on Germination and Physicochemical Properties of Moist Wheat Grai
Author: Yuan, Shuning; Hu, Yu; Wang, Bo; Lv, Tian; Jiang, Hao

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-025-10612-w
8、Plasma Vitrification of Waste Incineration Fly Ash: A Revie
Author: Xue, Zhiliang; Du, Zhaohui; Zhang, Hao; Li, Pei; Du, Changming

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2026; Vol. 46, Issue 3, pp. -. DOI: 10.1007/s11090-025-10620-w