Japanese Journal Of Applied Physics

SCI SCIE

国际简称：JPN J APPL PHYS 参考译名：日本应用物理学杂志

主要研究方向：物理-物理：应用非预警期刊审稿周期：约2.0个月

《日本应用物理学杂志》(Japanese Journal Of Applied Physics)是一本由Japan Society of Applied Physics出版的以物理-物理：应用为研究特色的国际期刊，发表该领域相关的原创研究文章、评论文章和综述文章，及时报道该领域相关理论、实践和应用学科的最新发现，旨在促进该学科领域科学信息的快速交流。该期刊是一本未开放期刊，近三年没有被列入预警名单。

4区中科院分区
Q4 JCR分区
841 年发文量
1.7 IF影响因子
未开放 是否OA
116 H-index
1962 创刊年份
Monthly 出版周期
English 出版语言

The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).

JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields:

• Semiconductors, dielectrics, and organic materials

• Photonics, quantum electronics, optics, and spectroscopy

• Spintronics, superconductivity, and strongly correlated materials

• Device physics including quantum information processing

• Physics-based circuits and systems

• Nanoscale science and technology

• Crystal growth, surfaces, interfaces, thin films, and bulk materials

• Plasmas, applied atomic and molecular physics, and applied nuclear physics

• Device processing, fabrication and measurement technologies, and instrumentation

• Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS

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Japanese Journal Of Applied Physics期刊信息

ISSN：0021-4922
出版语言：English
是否OA：未开放
E-ISSN：1347-4065
出版地区：JAPAN
是否预警：否
出版商：Japan Society of Applied Physics
出版周期：Monthly
创刊时间：1962
开源占比：0.0648
Gold OA文章占比：37.33%
OA被引用占比：
出版国人文章占比：0
出版撤稿占比：
研究类文章占比：96.31%

Japanese Journal Of Applied Physics CiteScore评价数据（2026年6月最新版）

CiteScore

SJR

SNIP

CiteScore 指数

3.1

0.282

0.648

学科类别	分区	排名	百分位
大类：Engineering 小类：General Engineering	Q2	140 / 351	60%
大类：Engineering 小类：General Physics and Astronomy	Q2	108 / 248	56%

名词解释：CiteScore 是衡量期刊所发表文献的平均受引用次数，是在 Scopus 中衡量期刊影响力的另一个指标。当年CiteScore 的计算依据是期刊最近4年（含计算年度）的被引次数除以该期刊近四年发表的文献数。例如，2022年的 CiteScore 计算方法为：2022年的 CiteScore =2019-2022年收到的对2019-2022年发表的文件的引用数量÷2019-2022年发布的文献数量注：文献类型包括：文章、评论、会议论文、书籍章节和数据论文。

Japanese Journal Of Applied Physics中科院评价数据

《新锐期刊分区表》（2026年3月发布）

Top期刊	综述期刊	大类学科		小类学科
否	否	物理与天体物理	4区	PHYSICS, APPLIED 物理：应用	4区

Japanese Journal Of Applied Physics JCR评价数据

2025-2026年最新版

按JCI指标学科分区	收录子集	分区	排名	百分位
学科：PHYSICS, APPLIED	SCIE	Q4	145 / 191	24.3
学科：PHYSICS, APPLIED	SCIE	Q4	147 / 191	23.3

Japanese Journal Of Applied Physics历年数据统计

影响因子

中科院分区

Japanese Journal Of Applied Physics中国学者发文选摘

1、Heterogeneously integrated IGZTO-CMOS neuromorphic CIM achieving 34.8 TOPS W-1 and 87.7 fJ write energ
Author: He, Zhaolong; Chen, Kai; Wang, Hanfeng; Guo, Yaolei; Cheng, Yue; Tang, Chenhao; Li, Yunlong; Zhang, Rui; Li, Junkang; Ma, Yitao

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 7, pp. -. DOI: 10.35848/1347-4065/ae4be5
2、High-efficiency AWB circuit engine using ultra-lightweight Half-SqueezeNet-DSC architecture with attention-based complexity reductio
Author: Wang, Hanfeng; He, Zhaolong; Cheng, Yue; Zhu, Hongbo; Gao, Dawei; Fang, Wenzhang; Ma, Yitao

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 7, pp. -. DOI: 10.35848/1347-4065/ae5253
3、Overcoming the resistivity-roughness trade-off in 3D dynamic random-access memory interconnects via nucleation-modulated atomic layer depositio
Author: Qin, Weidu; Sun, Jiabao; Qin, Yayuan; Ding, Shanshan; Han, Baodong; Sun, Hongbo; Tian, Chao; Zhao, Chao

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 7, pp. -. DOI: 10.35848/1347-4065/ae5195
4、Fabrication of nano-scale blue GaN-based nanopillar array LEDs for near-eye display
Author: Zhang, Le; Fu, Song; Yang, Kailai; Kang, Junjie; Liang, Meng; Wang, Junxi; Li, Jinmin; Liu, Zhiqiang

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 7, pp. -. DOI: 10.35848/1347-4065/ae574a
5、Multi-physics simulation and experimental optimization of diamond deposition in a cylindrical MPCVD reacto
Author: Xu, Manman; Dong, Hao; Zhu, Minghui; Lu, Yimin; Zhang, Xin

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 7, pp. -. DOI: 10.35848/1347-4065/ae5749
6、Study on local and non-local effects: from dimers to overlapping nanowire
Author: Zhang, Xi; Wu, Qingzhou; Wang, Tao; Li, Lei; Li, Zewen; Kan, Weiwei

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 6, pp. -. DOI: 10.35848/1347-4065/ae4a5f
7、Single-field-plate GaN HEMTs achieving >2400 V breakdown voltage and 106% dynamic on-resistance at 600 V stres
Author: Yang, Zhichao; Liao, Eason; Zhuang, Jungang; Dong, Hao; Zhang, Shuangshuang; Zhu, Lei; Yang, Zezheng; Zhang, Bingliang; Yu, Guohao; Zeng, Zhongming; Zhang, Baoshun

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 6, pp. -. DOI: 10.35848/1347-4065/ae4af0
8、Period arraying Al-nanometal enhanced photoresponsivity of β-Ga2O3 -based solar-blind deep UV photodetectors via localized surface plasmon resonanc
Author: Song, Dongyu; Fu, Rongpeng; Fu, Shihao; Wang, Yuefei; Li, Bingsheng; Shen, Aidong; Liu, Yichun

Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2026; Vol. 65, Issue 6, pp. -. DOI: 10.35848/1347-4065/ae4436